Beam splitters and pattern generators are diffractive optical elements for generation of 1- and 2-dimensional spot arrays (n x m). The are suitable for parallel laser material processing, parallel laser scanning, laser perforation  and optical measurement to icrease throughput.

- Light efficiency up to 95 %

- Beam splitting ratio with high uniformity up to 1%

- High damage threshold

- independent of polarisation

- for 1064, 532, 355 and 266 nm

- Standard and customized UVFS elements