The new tunable femtosecond laser Orpheus-NEO is a technical advancement of Orpheus-HP and Orpheus-ONE models. Orpheus-NEO-HP provides a tuning range from 640 to 2600 nm, Orpheus-NEO-ONE from 1350 to 4500 nm. The tuning range can be extended optionally to UV down to 320 nm by a fully integrated harmonic module or to IR up to 16 µm with an integrated DFG stage. The system delivers pulses in the range from 100 to 300 fs at a repetition rate of up to 2 MHz. Orpheus-NEO is pumped by up to 80 W, 800 µJ @ 1030 nm (e.g. Carbide 80 W, 800 µJ).

Compared to previous Orpheus models, Orpheus-NEO is hermetically sealed which ensures extremely high long-term power stability and pulse-to-pulse energy stability of <1%. In addition, the system comes with integrated diagnostics for complete internal monitoring and beam tracking. This enables fast and easy remote maintenance.

Orpheus-NEO was developed to meet most demanding user requirements regarding stability, flexibility and user-friendliness. The system is dedicated for multiphoton microscopy, ultrafast spectroscopy and many more scientific applications.

For more details, please visit our product pages on Tunable Femtosecond Laser Orpheus-NEO